Fabrication of ZnO nanodisc arrays is reported using nanoimprint lithography (NIL) mold obtained sub-100 nm pattern resolution by Srinivasan, Krishnamoorthy and co-workers.
ZnO nanostructures have many applications such as use in LEDs, gas sensors and semiconducting devices. Controlling the densities, geometric attributes and batch to batch reproducibility of nanostructured ZnO can be a challenge. In this hot paper, a generic process is described, using block copolymer assisted NIL, to produce high-resolution NIL molds for the production of ZnO nanodiscs. The authors also investigate the charge storage properties of the produced ZnO nanodiscs.
Macroscopic high density nanodisc arrays of zinc oxide fabricated by block copolymer self-assembly assisted nanoimprint lithography
J. Mater. Chem., 2012, 22, 21871. DOI: 10.1039/c2jm33444e
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