Nanoscale themed issue: Lithography

Nanoscale is delighted to present issue 7 as a high-profile themed issue on Lithography, Guest Edited by Professor Karl K. Berggren (MIT).

This themed issue of Nanoscale, focusing on nanopattering, provides insight into the latest research in the field of nanopatterning from a variety of angles, including optical beams, self-assembly, interference lithography, and applications to materials science, electronics, and biology – browse the issue today.cover

The issue’s front cover features the work of Veronica Savu and colleagues on nano-patterning and the 100 mm dynamic stencils with nano-apertures
(DOI: 10.1039/C1NR10083A).

Take a look at this high-impact issue now, which includes the following articles:

Review
Adhesive lithography for fabricating organic electronic and optoelectronics devices
Zhe Wang, Rubo Xing, Xinhong Yu and Yanchun Han
Nanoscale, 2011, 3, 2663

Feature Articles

Lithography, metrology and nanomanufacturing
J. Alexander Liddle and Gregg M. Gallatin
Nanoscale, 2011, 3, 2679

Emerging fabrication techniques for 3D nano-structuring in plasmonics and single molecule studies
F. De Angelis, C. Liberale, M. L. Coluccio, G. Cojoc and E. Di Fabrizio
Nanoscale, 2011, 3, 2689

Want to read more about our themed issues? Please visit the ‘Themed Issues’ page on our website.

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