We are delighted to announce a high-profile themed issue on Lithography, to be published in the exciting new journal Nanoscale in 2011. The themed issue will be Guest Edited by Karl Berggren (MIT).
Submit to this themed issue – submission deadline 14 January 2011
The aim of this issue is to present the latest results in the area of lithography, with a particular focus on emerging methods.
The field of nanotechnology has grown extensively in recent years, with tremendous progress being made both in the areas of devices and materials. Further technology development requires new methods of patterning and control, i.e. lithography.
To keep up with the demands of both large-scale manufacturing, small-scale industrial prototyping, and most importantly, the pace of new developments in the research community, a broad array of nanolithography tools and techniques must be developed. These tools and methods span length scales from microns to angstroms, ranging from top-down control to bottom-up self-assembly.
Techniques of interest to this issue include:
- templated self-assembly
- ultra-high-resolution resists
- nano-optical methods
- novel charged-particle-beam methods
- directed assembly at the nano and atomic scales using mechanical probes
- self-assembly using directed biological systems
- Lithographic modalities both with and without resists
- chemical patterning
- beam-induced etching
- beam-induced deposition
