Hot Communication: Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas

Graphical abstract: Atomic layer deposition of tin oxide with nitric oxide as an oxidant gasNanostructured transparent conducting oxides are used as electrodes/conductors in thin-film solar cells. The high light absorption offered by nanostructures provides a large surface area which increases the conversion efficiency of the solar cells. In Hot Communication, Jaeyeong Heo, Sang Bok Kim and Roy G. Gordon report a method for atomic layer deposition of tin oxide using nitric oxide as an oxidant gas. The team say this is the first report of using of NO as an oxidant gas for atomic layer deposition. Read the article for free until 17th April:

Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas: Jaeyeong Heo, Sang Bok Kim and Roy G. Gordon, J. Mater. Chem., 2012, 22, 4599-4602

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