Archive for July, 2011

Nanoscale’s first official Impact Factor

New citation data just released by Thomson ISI* shows the first official Impact Factor of Nanoscale to be 4.11.

This great news demonstrates the journal has attracted and published some outstanding research since its launch and we look forward to building on this achievement in the months and years ahead.

Since its launch in late 2009, Nanoscale has quickly established itself as a platform for high-quality research which bridges the various disciplines involved with nanoscience and nanotechnology. Nanoscale continues to attract work of the highest quality and impact; disseminating the latest exciting research to its large, community-spanning international readership.

The Editorial Office thanks all our Board members, authors and readers for their support –  Nanoscale is your journal.

Find out more about RSC Publishing’s 2010 Impact Factors

*A technical error by Thomson ISI resulted in Nanoscale’s omission from the initial release of figures. The Journal Citation Report (JCR) will be corrected soon, but further information about Nanoscale’s Impact Factor can be found on the JCR Notices page.

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Nanoscale themed issue: Lithography

Nanoscale is delighted to present issue 7 as a high-profile themed issue on Lithography, Guest Edited by Professor Karl K. Berggren (MIT).

This themed issue of Nanoscale, focusing on nanopattering, provides insight into the latest research in the field of nanopatterning from a variety of angles, including optical beams, self-assembly, interference lithography, and applications to materials science, electronics, and biology - browse the issue today.cover

The issue’s front cover features the work of Veronica Savu and colleagues on nano-patterning and the 100 mm dynamic stencils with nano-apertures
(DOI: 10.1039/C1NR10083A).

Take a look at this high-impact issue now, which includes the following articles:

Review
Adhesive lithography for fabricating organic electronic and optoelectronics devices
Zhe Wang, Rubo Xing, Xinhong Yu and Yanchun Han
Nanoscale, 2011, 3, 2663

Feature Articles

Lithography, metrology and nanomanufacturing
J. Alexander Liddle and Gregg M. Gallatin
Nanoscale, 2011, 3, 2679

Emerging fabrication techniques for 3D nano-structuring in plasmonics and single molecule studies
F. De Angelis, C. Liberale, M. L. Coluccio, G. Cojoc and E. Di Fabrizio
Nanoscale, 2011, 3, 2689

Want to read more about our themed issues? Please visit the ‘Themed Issues’ page on our website.

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Nanoscale Poster Prize: Nanoformulation2011

We are delighted to announce that two Nanoscale Poster Prizes were awarded at the recent NanoFormulation2011, held in Singapore, 26 June to 1 July 2011, as part of ICMAT.

Prize winner 2

Lok Kumar Shrestha with David Higgins

The winners of the Nanoscale Poster Prizes were Johannes Kluge and Lok Kumar Shrestha:

Stability of Amorphous Nano-formulations: the solubility of Ketoprofen in colloidal PLGA
Authors: Johannes Kluge; Gerhard Muhrer and Marco Mazzotti

Structure and dynamics of non-ionic surfactant micelles in non-aqueous media
Authors: Lok Kumar Shrestha; Rekha Shrestha, Takaaki Sato. Kenji Aramaki; Katsuhiko Ariga

Prize winner

Johannes Kluge with David Higgins

Nanoscale will be awarding further Poster Prizes over the summer so watch this space!

Sign-up to the free Nanoscale e-alert and Nanobites Newsletter to read the latest content and news.

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