The 3rd Functional Oxide Thin Films for Advanced Energy and Information Technology conference will be taking place from the 5th – 8th July 2017 in Rome, Italy.
The purpose of this meeting is to foster the exchange of ideas between the relevant energy and information themes, with the overall aim of sparking extensive discussions on the advances that materials physics and chemistry can make in thin film applications.
Key Sessions Include: Engineering and control of defects in complex oxides, fabrication and synthesis of oxide thin films and heterostructures, advanced characterization techniques for thin films, electronic and ionic transport in oxide thin films, magnetism and dielectric properties in oxide thin films, nanoionic and nanoelectronic oxide thin films: towards application, thin film oxides in energy conversion and storage applications, thin film oxides in information technology.
Confirmed keynote speakers include; Scott Chambers (Pacific Northwest National Laboratory), Chang-Beom Eom (University of Wisconsin-Madison), Jean-Marc Triscone (University of Geneva), Schmitt Thorsten (Paul Scherrer Institut), Harry Tuller (Massachusetts Institute of Technology), Darrell Schlom (Cornell University), Jochen Mannhart (Max Planck Institute of Solid State Research).
To view all of the conference speakers or for further information concerning the conference, please visit: https://www.fusion-conferences.com/conference68.php
There is an Earlybird registration deadline of the 25th January 2017 and the final registration deadline of the 17th May 2017.
Journal of Materials Chemistry C is delighted to be supporting this event.